首页> 外国专利> Method and system for forming copper indium gallium sulfur selenide absorption layer and cadmium sulfide buffer layer under non-vacuum condition

Method and system for forming copper indium gallium sulfur selenide absorption layer and cadmium sulfide buffer layer under non-vacuum condition

机译:非真空条件下形成铜铟镓硒硒化物吸收层和硫化镉缓冲层的方法及系统

摘要

A method and a system for forming a copper indium gallium sulfur selenide (CIGSSe) absorption layer and a cadmium sulfide (CdS) buffer layer under non-vacuum condition is disclosed. A coating layer is formed on the back electrode layer on the substrate by mixing the slurry on the back electrode layer, and the coating layer formed on the back electrode layer is densified by a densification device after initially dried, and then a primary selenization/sulfurization reaction process is carried out to form a primary CIGSSe layer, and then a thermal process is carried out to improve the lattice match of the primary CIGSSe layer, and then an impurity cleaning process is carried out by using potassium cyanide or bromide to remove the impurities of cuprous selenide and copper sulfide, and then a rear-stage selenization/sulfurization reaction process is carried out to produce the required rear-stage CIGSSe absorption layer. Finally, a CdS buffer layer is formed on the CIGSSe absorption layer by a chemical bath deposition method.
机译:公开了一种在非真空条件下形成铜铟镓硒硒(CIGSSe)吸收层和硫化镉(CdS)缓冲层的方法和系统。通过在背电极层上混合浆料在基板上的背电极层上形成涂层,并且在初始干燥之后,通过致密化装置使在背电极层上形成的涂层致密化,然后进行初次硒化/硫化。进行反应过程以形成初级CIGSSe层,然后进行热处理以改善初级CIGSSe层的晶格匹配,然后通过使用氰化钾或溴化物进行杂质清洗工艺以去除杂质进行亚硒化亚铜和硫化铜的合成,然后进行后阶段的硒化/硫化反应工艺,以生产所需的后阶段的CIGSSe吸收层。最后,通过化学浴沉积法在CIGSSe吸收层上形成CdS缓冲层。

著录项

  • 公开/公告号US7998789B1

    专利类型

  • 公开/公告日2011-08-16

    原文格式PDF

  • 申请/专利权人 CHUAN-LUNG CHUANG;

    申请/专利号US20100761513

  • 发明设计人 CHUAN-LUNG CHUANG;

    申请日2010-04-16

  • 分类号H01L21/00;H01L21/16;H01G9/20;

  • 国家 US

  • 入库时间 2022-08-21 18:11:56

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