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Photomask using separated exposure technique, method of fabricating photomask, and apparatus for fabricating photomask by using the method
Photomask using separated exposure technique, method of fabricating photomask, and apparatus for fabricating photomask by using the method
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机译:使用分离曝光技术的光掩模,制造光掩模的方法以及使用该方法制造光掩模的设备
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摘要
A method of fabricating a photomask may include forming a light-shielding layer and a first resist film on a substrate, forming a first resist pattern by exposing first exposed regions of the first resist film to a first exposure source that may have a first energy, forming a first light shielding pattern by etching the selectively exposed light-shielding layer by using the first resist pattern as an etching mask, removing the first resist pattern, forming a second resist film on the first light-shielding layer, exposing second exposed regions of the second resist film that may have a desired pattern shape to a second exposure source that may have a second energy, forming a second light shielding pattern by etching the selectively exposed first light shielding pattern by using the second resist pattern as an etching mask, and removing the second resist pattern.
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