IMPROVING THE ADHESIVENESS OF FLUOROCARBON(CFX) FILM BY DOPING OF AMORPHOUS CARBON

摘要

A method of forming an amorphous carbon layer on an insulating layer includes the step of forming an amorphous carbon layer using a plasma reaction process. The amorphous carbon layer is formed in an atmosphere containing a plasma excitation gas, a CxHy series gas, a silicon containing gas, and an oxygen-containing gas.