Adhesiveness of fluorocarbon (CFX) film by doping of amorphous carbon

摘要

A method of forming an amorphous carbon layer on an insulating layer includes the step of forming an amorphous carbon layer using a plasma reaction process. The amorphous carbon layer is formed in an atmosphere containing a plasma excitation gas, a C_xH_y series gas, a silicon-containing gas, and an oxygen-containing gas.