MANUFACTURING METHOD OF AN ULTRA-LOW-DIELECTRIC MEMBRANE CAPABLE OF SECURING THE MECHANICAL STRENGTH, AND THE ULTRA-LOW-DIELECTRIC MEMBRANE

摘要

PURPOSE: A manufacturing method of an ultra-low-dielectric membrane, and the ultra-low-dielectric membrane are provided to offer the extremely low dielectric rate, and to provide nano-sized close pores.;CONSTITUTION: A manufacturing method of an ultra-low-dielectric membrane comprises the following steps: forming a mixed solution by adding a compound marked with chemical formula 1: R1OCH2[CH(OR2)]nCH2OR3, and a poly alkylsilsesquioxan copolymer to an organic solvent; coating the mixed solution to a substrate, to form a thin film; heating the thin film to 200~300 deg C: heat-processing the thin film after heating into 350~500deg C; and irradiating ultraviolet rays while heat-processing for 5~30 minutes.;COPYRIGHT KIPO 2011