首页> 外国专利> ELECTROSTATIC DISCHARGE PROTECTION ELEMENT, CAPABLE OF PREVENTING DAMAGE TO AN INTERNAL CIRCUIT DUE TO ELECTROSTATIC DISCHARGE STRESS

ELECTROSTATIC DISCHARGE PROTECTION ELEMENT, CAPABLE OF PREVENTING DAMAGE TO AN INTERNAL CIRCUIT DUE TO ELECTROSTATIC DISCHARGE STRESS

机译:静电放电保护元件,能够防止由于静电放电应力导致的内部电路损坏

摘要

PURPOSE: An electrostatic discharge protection element is provided to appropriately control a thermal destruction voltage and a snapback prevention voltage by controlling the number and size of a diode which is serially connected to.;CONSTITUTION: A deep-N well(400) is formed in the fixed region of a semiconductor substrate. An N-well(420) for an anode and a P-well(410) for a MOSFET are formed within the deep-N well. A P-well(430) for a diode is additionally arranged in the vicinity of the P-well for a MOSFET. The N-well is inserted into a space between the P-well for a MOSFET and the P-well for a diode. An N region(431) for the diffusion of a diode and a P region(432) for the diffusion of a diode pick-up are arranged inside the P-well for a diode.;COPYRIGHT KIPO 2011
机译:目的:提供静电放电保护元件,以通过控制串联的二极管的数量和大小来适当地控制热破坏电压和防止回跳电压。组成:一个深N阱(400)形成在其中半导体衬底的固定区域。在深N阱内形成用于阳极的N阱(420)和用于MOSFET的P阱(410)。用于二极管的P阱(430)另外布置在用于MOSFET的P阱附近。 N阱插入MOSFET的P阱和二极管的P阱之间的空间。二极管的P阱内部布置有用于扩散二极管的N区(431)和用于吸收二极管的P区(432)。COPYRIGHTKIPO 2011

著录项

  • 公开/公告号KR20100128506A

    专利类型

  • 公开/公告日2010-12-08

    原文格式PDF

  • 申请/专利权人 BAUABTECH;

    申请/专利号KR20090046928

  • 发明设计人 KIM KIL HO;

    申请日2009-05-28

  • 分类号H01L23/60;H01L27/04;

  • 国家 KR

  • 入库时间 2022-08-21 17:53:12

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