WAVE FRONT ABERRATION MEASURING APPARATUS CAPABLE OF PRECISELY MEASURING WAVE FRONT ABERRATION OF AN OPTICAL SYSTEM OF AN OBJECT, AN EXPOSURE DEVICE, AND A METHOD FOR MANUFACTURING A DEVICE

摘要

PURPOSE: A wave front aberration measuring apparatus is provided to maintain the optical performance of a projection optical system with high precision by correcting the position of a lens group comprising the projection optical system based on the calculated wave front aberration.;CONSTITUTION: A production unit(55a) produces a wave front aberration based on an interference pattern imaged by an image pickup device(53). A determining unit(55b) produces the evaluation value which shows the wave front based on the produced wave front aberration. A memory unit(55c) stores parameter information for producing the wave front aberration. The wave front aberration information of a projection optical system(31) stored in the memory unit is transmitted to a main controller(80). The main controller produces the wavelength operation quantity and the lens operating quantity for correcting the wave front aberration.;COPYRIGHT KIPO 2011