WAVE FRONT ABERRATION MEASURING METHOD, WAVE FRONT ABERRATION MEASURING DEVICE, MANUFACTURING METHOD OF IMAGING OPTICAL SYSTEM AND MANUFACTURING METHOD OF EXPOSURE DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a measuring method of wave front aberration wherein the whole wave front is not modulated due to a position measurement error of a part of a spot.;SOLUTION: A spherical wave SW outputted from a floodlighting optical system 12 is converted into parallel beams PB by a relay lens 14 through a pinhole in a first plane 13 of this wave front aberration measuring device 11 provided on the imaging position of the floodlighting optical system 12. The parallel beams PB enter a micro-lens array 16 formed by arranging many micro-lenses two-dimensionally. The parallel beams PB are imaged by each micro-lens as secondary images on an imaging element (CCD) 17 arranged on a prescribed position. When measuring the imaging position by the imaging element and operating the wave front aberration therefrom, data satisfying a specific standard among data of the variation of a spot position are removed, and the wave front aberration is measured based on the residual data.;COPYRIGHT: (C)2004,JPO