Device of washing using pulse zet type cleanning solution supply

摘要

A cleaning device for supplying the cleaning liquid supplied to the substrate or the type of pressure applied to the cleaning liquid to a pulse type that repeats supplying and stopping for a predetermined time, and the supplying cleaning liquid is set at a high pressure of about 20 kg / cm ² . Is disclosed.;According to the present invention, the water film is formed on the substrate surface during the cleaning process to eliminate the problem of lowering the cleaning efficiency, thereby improving the cleaning efficiency and saving the cleaning liquid.