首页> 外国专利> Stacked nonvolatile memory cell device, and nonvolatile memory cell stack, nonvolatile memory cell string, nonvolatile memory cell array using the cell device, and fabricating method thereof

Stacked nonvolatile memory cell device, and nonvolatile memory cell stack, nonvolatile memory cell string, nonvolatile memory cell array using the cell device, and fabricating method thereof

机译:堆叠的非易失性存储单元器件,非易失性存储单元堆叠,非易失性存储单元串,使用该单元器件的非易失性存储单元阵列及其制造方法

摘要

PURPOSE: A stacked nonvolatile memory cell device, a nonvolatile memory cell stack, a nonvolatile memory cell string, a nonvolatile memory cell array using the same, and a method for manufacturing the same is provided to improve a sell spreading property by comprising a body in which a channel is formed into a single crystal semiconductor. CONSTITUTION: A control electrode(8) is formed on the surface of a semiconductor substrate(1) into a vertical pillar type. An insulating film is formed between the control electrode and the semiconductor substrate. A gate stack(14) is formed on the lateral side of the control electrode. A first insulating film(9) is formed on the lateral side of the gate stack. A first semiconductor region(10) is formed on the lateral side of the first insulating film. A second semiconductor region(11) is formed on the lateral side of the gate stack.
机译:目的:提供一种堆叠式非易失性存储单元装置,非易失性存储单元堆叠,非易失性存储单元串,使用其的非易失性存储单元阵列及其制造方法,以通过在主体中包括主体来改善销售扩展性。沟道形成单晶半导体。组成:一个控制电极(8)形成在一个半导体基板(1)的表面为垂直柱型。在控制电极和半导体衬底之间形成绝缘膜。在控制电极的侧面上形成栅叠层(14)。在栅极堆叠的侧面上形成第一绝缘膜(9)。在第一绝缘膜的侧面上形成第一半导体区域(10)。在栅极叠层的侧面上形成第二半导体区域(11)。

著录项

  • 公开/公告号KR101002297B1

    专利类型

  • 公开/公告日2010-12-20

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20080125613

  • 发明设计人 이종호;

    申请日2008-12-11

  • 分类号H01L27/115;H01L21/8247;

  • 国家 KR

  • 入库时间 2022-08-21 17:52:54

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