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RAW MATERIALS SUPPLYING APPARATUS AND A SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, CAPABLE OF IMPROVING THE DEPOSITION EFFICIENCY OF THIN FILMS
RAW MATERIALS SUPPLYING APPARATUS AND A SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, CAPABLE OF IMPROVING THE DEPOSITION EFFICIENCY OF THIN FILMS
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机译:原材料供应设备和基质处理设备,包括相同的设备,能够提高薄膜的沉积效率
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摘要
PURPOSE: A raw materials supplying apparatus and a substrate processing apparatus including the same are provided to increase the decomposition of the raw materials by spraying the raw materials into a space between substrates.;CONSTITUTION: A first spraying unit(310) sprays at least two raw materials on a substrate through different routes. A second spraying unit(320) sprays a raw material with high decomposition temperature on the substrate. The decomposition temperature of the raw material sprayed from the second spraying unit is higher than that of raw materials sprayed from the first spraying unit. The first spraying unit is separated into two or more. The first spraying unit is arranged based on the second spraying unit.;COPYRIGHT KIPO 2011
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