首页> 外国专利> CHARGED-PARTICLE BEAM WRITING METHOD AND A CHARGED-PARTICLE BEAM WRITING APPARATUS, CAPABLE OF REDUCING THE NUMBER OF STAGE MOVEMENT BETWEEN STRIPES

CHARGED-PARTICLE BEAM WRITING METHOD AND A CHARGED-PARTICLE BEAM WRITING APPARATUS, CAPABLE OF REDUCING THE NUMBER OF STAGE MOVEMENT BETWEEN STRIPES

机译:带电粒子束的写入方法及带电粒子束的写入装置,能够减少条带间的移动量

摘要

PURPOSE: A charged-particle beam writing method and a charged-particle beam writing apparatus are provided to shorten the writing time for writing a plurality of writing groups by shortening the movement time of XY stage mounting the sample.;CONSTITUTION: A memory device(144) stores the layout information of a plurality of patterned chips. A writing group setting part(108) comprising one or more chip sets a plurality of writing groups. A frame setting part(112) sets the frame which surrounds all the chip area within the writing group. An area divider(114) virtually partitions the frame into a plurality of areas.;COPYRIGHT KIPO 2011
机译:目的:提供一种带电粒子束写入方法和一种带电粒子束写入设备,以通过缩短安装样品的XY平台的移动时间来缩短用于写入多个写入组的写入时间。 144)存储多个图案化芯片的布局信息。包括一个或多个芯片的写组设置部分(108)设置多个写组。框设定部(112)设定包围写入组内的所有芯片区域的框。区域分隔器(114)实际上将框架划分为多个区域。; COPYRIGHT KIPO 2011

著录项

  • 公开/公告号KR20110030344A

    专利类型

  • 公开/公告日2011-03-23

    原文格式PDF

  • 申请/专利权人 NUFLARE TECHNOLOGY INC.;

    申请/专利号KR20100089718

  • 发明设计人 ANPO AKIHITO;

    申请日2010-09-14

  • 分类号H01L21/027;

  • 国家 KR

  • 入库时间 2022-08-21 17:52:17

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