ETCHANT COMPOSITION CAPABLE OF EFFICIENTLY ETCHING A TRILAYER CONSISTING OF AN INDIUM-BASED METAL LAYER, ALUMINUM-LANTHANUM-BASED ALLOY FILM, AND TITANIUM-BASED METAL FILM

摘要

PURPOSE: An etchant composition is provided to ensure excellent etching property to an indium-based metal layer, aluminum-lanthanum-based alloy film, and titanium-based metal film, and excellent etching profile, and to prevent underlayer damage and residue generation.;CONSTITUTION: An etchant composition of a trilayer consisting of an indium-based metal layer, aluminum-lanthanum-based alloy film, and titanium-based metal film includes, based on the total weight of the composition, 1-15 weight% of hydrogen peroxide, 0.1-10 weight% of inorganic acid, 1-15 weight% of hydrogen peroxide, 0.1-10 weight% of fluorine-containing compound, and the remaining amount of water.;COPYRIGHT KIPO 2011