...
首页> 外文期刊>Japanese journal of applied physics >Oxidation Characteristics of Thin Al-Mo Alloy Films with Various Compositions as Metal Capping Layer on Cu
【24h】

Oxidation Characteristics of Thin Al-Mo Alloy Films with Various Compositions as Metal Capping Layer on Cu

机译:Cu上不同组成的金属盖层Al-Mo合金薄膜的氧化特性

获取原文
获取原文并翻译 | 示例
   

获取外文期刊封面封底 >>

       

摘要

The oxidation characteristics of Al-Mo alloy films (50 nm) deposited on Cu as a metal capping layer have been examined by varying the alloy composition. Cu oxidation from the surface and Cu out-diffusion toward the surface are well suppressed when using Al-Mo alloy with a Mo-rich composition. By using an AI_(15)Mo_(85) alloy film, in which fine crystalline grains of AIM03 are dispersed in an amorphous phase of the alloy, a well-separated layer configuration of oxide/Al-Mo alloy/Cu without excess Cu diffusion and/or preferential Al oxidation in the alloy layer is realized upon oxidation at 350 ℃ for 1 h in air. It is revealed that Al_(15)Mo_(85) alloy films are a useful candidate material of a metal capping layer for Cu interconnects.
机译:通过改变合金组成,已经研究了沉积在作为金属覆盖层的铜上的Al-Mo合金膜(50 nm)的氧化特性。当使用具有富Mo组成的Al-Mo合金时,可以很好地抑制Cu从表面的氧化和Cu向表面的向外扩散。通过使用AI_(15)Mo_(85)合金膜(其中AIM03的细晶粒分散在合金的非晶相中),氧化物/ Al-Mo合金/ Cu的层分离良好,而Cu不会过度扩散在空气中于350℃下氧化1 h,可实现合金层中Al的优先氧化。揭示了Al_(15)Mo_(85)合金膜是用于Cu互连的金属覆盖层的有用候选材料。

著录项

  • 来源
    《Japanese journal of applied physics》 |2012年第5issue2期|p.05EA06.1-05EA06.5|共5页
  • 作者单位

    Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan;

    Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号