首页> 外文期刊>Japanese journal of applied physics >Estimation of carrier mobility and charge behaviors of organic semiconductor films in metal-insulator-semiconductor diodes consisting of high-κ oxide/organic semiconductor double layers
【24h】

Estimation of carrier mobility and charge behaviors of organic semiconductor films in metal-insulator-semiconductor diodes consisting of high-κ oxide/organic semiconductor double layers

机译:估算由高κ氧化物/有机半导体双层构成的金属-绝缘体-半导体二极管中有机半导体膜的载流子迁移率和电荷行为

获取原文
获取原文并翻译 | 示例

摘要

We have comparatively studied the charge behaviors of organic semiconductor films based on charge extraction by linearly increasing voltage in a metal-insulator-semiconductor (MIS) diode structure (MIS-CELIV) and by classical capacitance-voltage measurement. The MIS-CELIV technique allows the selective measurement of electron and hole mobilities of n- and p-type organic films with thicknesses representative of those of actual devices. We used an anodic oxidized sputtered Ta or Hf electrode as a high-k layer, and it effectively blocked holes at the insulator/semiconductor interface. We estimated the hole mobilities of the polythiophene derivatives regioregular poly(3-hexylthiophene) (P3HT) and poly(3,3 '''-didodecylquarterthiophene) (PQT-12) before and after heat treatment in the ITO/high-k/(thin polymer insulator)/semiconductor/MoO3/Ag device structure. The hole mobility of PQT-12 was improved from 1.1 x 10(-5) to 2.1 x 10(-5)cm(2)V(-1)s(-1) by the heat treatment of the device at 100 degrees C for 30 min. An almost two orders of magnitude higher mobility was obtained in MIS diodes with P3HT as the p-type layer. We also determined the capacitance from the displacement current in MIS diodes at a relatively low-voltage sweep, and it corresponded well to the classical capacitance-voltage and frequency measurement results. (C) 2018 The Japan Society of Applied Physics
机译:我们通过线性增加金属-绝缘体-半导体(MIS)二极管结构(MIS-CELIV)中的电压并通过经典的电容电压测量,基于电荷提取,对有机半导体膜的电荷行为进行了比较研究。 MIS-CELIV技术可以选择性地测量代表实际器件厚度的n型和p型有机膜的电子迁移率和空穴迁移率。我们使用阳极氧化的溅射Ta或Hf电极作为高k层,它有效地阻挡了绝缘体/半导体界面上的空穴。我们估算了ITO / high-k /(薄的聚合物绝缘体)/半导体/ MoO3 / Ag器件结构。通过在100摄氏度下对器件进行热处理,PQT-12的空穴迁移率从1.1 x 10(-5)提高到2.1 x 10(-5)cm(2)V(-1)s(-1) 30分钟在以P3HT作为p型层的MIS二极管中,获得了几乎两个数量级的迁移率。我们还从MIS二极管在较低电压扫描时的位移电流确定了电容,它与经典的电容电压和频率测量结果非常吻合。 (C)2018日本应用物理学会

著录项

  • 来源
    《Japanese journal of applied physics》 |2018年第2s2期|02CA05.1-02CA05.6|共6页
  • 作者

    Chosei Naoya; Itoh Eiji;

  • 作者单位

    Shinshu Univ, Dept Elect & Comp Engn, Nagano 3808553, Japan;

    Shinshu Univ, Dept Elect & Comp Engn, Nagano 3808553, Japan;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号