ETCHANT COMPOSITION FOR METAL FILM INCLUDING COPPER LAYER AND/OR COPPER ALLOY LAYER, AND ETCHING METHOD USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide an etchant composition which can precisely etch a metal film including a copper layer and/or a copper alloy layer and a laminated film including the layer and a layer formed of other metals, and has a long solution life.SOLUTION: The etchant composition for etching the metal film including the copper layer and/or the copper alloy layer includes copper (II) ions, -alanine and water. An etching method using the etchant composition is also provided.