DRY FILM PHOTO-RESIST CAPABLE OF IMPROVING THE RESOLUTION OF A MULTI-LAYERED STRUCTURE AND BEING EASILY HANDLED IN AN EXPOSING PROCESS

摘要

PURPOSE: A dry film photo-resist is provided to prevent the reduction of transparency in the dry film photo-resist regardless of a resin protective layer and obtain the superior resolution.;CONSTITUTION: A dry film photo-resist includes a supporting film, a resin protective layer, and a photosensitive resin layer. The resin protective layer includes water soluble polymer. The thickness of the resin protective layer is less than or equal to 10um. The thickness deviation of the resin protective layer is less than or equal to 1um. The haze of the resin protective layer is less than or equal to 3.0%. The adhesive of the supporting film and the resin protective layer is between 0.0005 and 0.01N/cm.;COPYRIGHT KIPO 2011