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METHOD FOR MANUFACTURING A POROUS THIN FILM STRUCTURE USING A DRY PROCESS, AND THE POROUS THIN FILM STRUCTURE MANUFACTURED BY THE SAME, CAPABLE OF RESOLVING THE PROBLEMS OF A WET PROCESS, AND EASILY CONTROLLING THE DRY PROCESS
METHOD FOR MANUFACTURING A POROUS THIN FILM STRUCTURE USING A DRY PROCESS, AND THE POROUS THIN FILM STRUCTURE MANUFACTURED BY THE SAME, CAPABLE OF RESOLVING THE PROBLEMS OF A WET PROCESS, AND EASILY CONTROLLING THE DRY PROCESS
PURPOSE: A method for manufacturing a porous thin film structure using a dry process, and the porous thin film structure manufactured by the same are provided to maintain a constant porosity, thereby reproducing the sensitivities of sensors manufactured by the structure.;CONSTITUTION: A method for manufacturing a porous thin film structure using a dry process comprises: a step of simultaneously depositing at least two elements, which have a different reactivity on a certain reactive gas from each other, in order to form an alloy thin film; and a step of manufacturing a porous thin film by selectively removing one element having a larger reactivity than the reactivity of the other from the alloy thin film. In the step of forming the alloy thin film, the alloy thin film is formed with the elements by sputter deposition. The alloy thin film includes at least two kinds of elements selected from a group of Pt, Pd, Ru, Rh, Ag, Au, Cr, Mn, Fe, Co, Ni, Cu, Si, As, Ge, Os, Re, Te, Ir, Al, B, C, O, N, P, Ti, V, Zr, Nb, Mo, Hf, Ta, and W. In the step of manufacturing the porous thin film, the element selectively removed is at least one kind selected from a group of Si, As, Ge, Os, Re, Te, Ir, Al, B, C, O, N, P, Cu, Cr, Ti, V, Zr, Nb, Mo, Hf, Ta, and W.;COPYRIGHT KIPO 2013
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