SUBSTRATE PROCESSING DEVICE FOR ENABLING THE CLEANING PERFORMANCE OF A SLIT NOZZLE BY SPRAYING CLEANING FLUID AND GAS SIMULTANEOUSLY

摘要

PURPOSE: A substrate processing device is provided to shorten cleaning hours by spraying cleaning fluid and gas simultaneously using two cleaning blocks. ;CONSTITUTION: A substrate processing device comprises a stage(3), a slit nozzle(41) and a nozzle cleaning tool(70). The stage supports a substrate(90). The slit nozzle supplies processing solution to the surface of the substrate supported on the stage. The nozzle cleaning tool cleans the tip of the slit nozzle, moving in the length direction of the slit nozzle. The nozzle cleaning tool comprises first and second cleaning blocks. The first and second cleaning blocks are successively arranged in a length direction and simultaneously move.;COPYRIGHT KIPO 2011