首页> 外国专利> DISC UNIT FOR CLEANING SUBSTRATES AND A SUBSTRATE CLEANING APPARATUS HAVING THE DISC UNIT, CAPABLE OF PREVENTING A LOSS OF CLEANING PERFORMANCE DUE TO WATER FILM BY SPRAYING CLEANING SOLUTION IN FINE PARTICLE SHAPE TROUGH AN INJECTION NOZZLE

DISC UNIT FOR CLEANING SUBSTRATES AND A SUBSTRATE CLEANING APPARATUS HAVING THE DISC UNIT, CAPABLE OF PREVENTING A LOSS OF CLEANING PERFORMANCE DUE TO WATER FILM BY SPRAYING CLEANING SOLUTION IN FINE PARTICLE SHAPE TROUGH AN INJECTION NOZZLE

机译:碟片清洁装置和具有碟片装置的基本清洁装置,可通过在细颗粒形状的喷射喷嘴中喷洒清洁剂来防止因水膜造成的清洁性能损失

摘要

PURPOSE: A disc unit for cleaning substrates and a substrate cleaning apparatus having the disc unit are provided to prevent the formation of water film between a grinding pad and a substrate surface when a grinding pad rubs against the surface of the substrate. ;CONSTITUTION: A disc unit(100) for cleaning substrates comprises a body(110), a grinding pad(120), an injection nozzle(130), and a supply passage. The grinding pad is installed in the lower part of the body and cleanses a substrate by grinding the surface of the substrate through contact. The lower part of the body is partially exposed by jetting holes(122) of the grinding pad. The injection nozzle is installed in the lower part of the body which is exposed by the jetting holes and sprays cleaning solution in the form of fine particles. The supply passage passes through the body and supplies the injection nozzle with cleaning solution.;COPYRIGHT KIPO 2011
机译:用途:提供用于清洁基板的盘单元和具有该盘单元的基板清洁设备,以防止当研磨垫摩擦基板表面时在研磨垫和基板表面之间形成水膜。 ;组成:用于清洁基板的盘单元(100)包括主体(110),研磨垫(120),喷嘴(130)和供应通道。研磨垫安装在主体的下部,并通过接触研磨基板表面来清洁基板。主体的下部被研磨垫的喷射孔(122)部分暴露。喷嘴安装在主体的下部,下部由喷孔露出,并以细颗粒的形式喷洒清洁液。供应通道穿过阀体,并向喷嘴提供清洁液。; COPYRIGHT KIPO 2011

著录项

  • 公开/公告号KR20110081507A

    专利类型

  • 公开/公告日2011-07-14

    原文格式PDF

  • 申请/专利权人 SEMES CO. LTD.;

    申请/专利号KR20100001701

  • 发明设计人 LEE MYUNG JIN;

    申请日2010-01-08

  • 分类号B08B1/04;B08B3/10;H01L21/302;

  • 国家 KR

  • 入库时间 2022-08-21 17:51:27

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