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POWER SUPPLY UNIT FOR A CVD(CHEMICAL VAPOR DEPOSITION) APPARATUS SUITABLE FOR THE GROWTH OF SILICON CRYSTAL AND A CONTROLLING METHOD THEREOF
POWER SUPPLY UNIT FOR A CVD(CHEMICAL VAPOR DEPOSITION) APPARATUS SUITABLE FOR THE GROWTH OF SILICON CRYSTAL AND A CONTROLLING METHOD THEREOF
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机译:适用于硅晶体生长的化学汽相淀积装置的电源装置及其控制方法
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摘要
PURPOSE: A power supply unit for a CVD(Chemical Vapor Deposition) apparatus and a controlling method thereof are provided to reduce manufacturing costs by keeping the high reliability of a switch including a switch controlling unit.;CONSTITUTION: An insulating transformer(410) outputs an input power source into a multi stage by insulating and transforming the input power source. A tab switching switch respectively controls a multi-stage output. An auxiliary transformer(420) has the secondary side coil of a dot direction which is different from the dot direction of the secondary side coil of the insulating transformer. One end part of a first switch(440) is connected to one end of the secondary side coil of the auxiliary transformer. A second switch(450) is connected between one end of the secondary side coil of the insulating transformer and the other end of the first switch. A third switch(460) is connected between the common connection point of the first and the second switch and the common connection point of loads.;COPYRIGHT KIPO 2012
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