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Growth of Hydrogenated Nano-crystalline Silicon (nc-Si:H) Films by Plasma Enhanced Chemical Vapor Deposition (PE-CVD)

机译：等离子体增强化学气相沉积（PE-CVD）氢化纳米晶体硅（NC-Si：H）膜的生长（PE-CVD）

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Ashok Jadhavar; Amit Pawbake; Ravindra Waykar; Vijaya Jadkar; Rupali Kulkarni; Ajinkya Bhorde; Sachin Rondiya; Adinath Funde; Dinkar Patil; Abhijit Date; Habib Pathan; Sandesh Jadkar;
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1. Influence of hydrogen dilution on structural, electrical and optical properties of hydrogenated nanocrystalline silicon (nc-Si : H) thin films prepared by plasma enhanced chemical vapour deposition (PE-CVD) [J] . Funde AM, Bakr NA, Kamble DK, Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion . 2008,第10期

机译：氢稀释对通过等离子体增强化学气相沉积（PE-CVD）制备的氢化纳米晶硅（nc-Si：H）薄膜的结构，电学和光学性质的影响
2. Influence of Argon Flow on Deposition of Hydrogenated Nanocrystalline Silicon (nc-Si:H) Films by Plasma Chemical Vapor Deposition [J] . A. M. Funde, N. A. Bakr, T. S. Salve, Journal of nano research . 2009,第期

机译：氩气流量对等离子体化学气相沉积氢化纳米晶硅（nc-Si：H）膜的影响
3. Influence of RF power on structural optical and electrical properties of hydrogenated nano-crystalline silicon (nc-Si:H) thin films deposited by PE-CVD [J] . Ashok Jadhavar, Amit Pawbake, Ravindra Waykar, Journal of materials science . 2016,第12期

机译：射频功率对通过PE-CVD沉积的氢化纳米晶硅（nc-Si：H）薄膜的结构光学和电学性质的影响
4. Growth of hydrogenated nano-crystalline silicon (nc-Si:H) films by plasma enhanced chemical vapor deposition (PE-CVD) [C] . Ashok Jadhavar, Amit Pawbake, Ravindra Waykar International Conference on Energy and Power . 2017

机译：等离子体增强化学气相沉积（PE-CVD）氢化纳米晶体硅（NC-Si：H）膜的生长（PE-CVD）
5. Plasma enhanced chemical vapor deposition of silicon thin films: Characterization of film growth at different frequencies and gas compositions utilizing plasma diagnostics. [D] . Zhu, Lala. 2014

机译：等离子体增强了硅薄膜的化学气相沉积：利用等离子体诊断技术表征不同频率和气体成分下的薄膜生长。
6. Investigations on the Role of N2:(N2 + CH4) Ratio on the Growth of Hydrophobic Nanostructured Hydrogenated Carbon Nitride Thin Films by Plasma Enhanced Chemical Vapor Deposition at Low Temperature [O] . Noor Hamizah Khanis, Richard Ritikos, Shafarina Azlinda Ahmad Kamal, 2017

机译：N2：（N2 + CH4）比在低温等离子体增强化学气相沉积法生长疏水纳米结构氢化氮化碳薄膜中的作用研究
7. Hydrogenated amorphous silicon carbide thin films deposited by plasma-enhanced chemical vapor deposition [O] . Shiguo Yang, Guozhi Wen, Yang Luo, 2016

机译：通过等离子体增强的化学气相沉积沉积氢化非晶碳化硅薄膜

Growth of Hydrogenated Nano-crystalline Silicon (nc-Si:H) Films by Plasma Enhanced Chemical Vapor Deposition (PE-CVD)

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