LASER PATTERNING SYSTEM AND METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE USING THE SAME CAPABLE OF SUPPRESSING THERMAL DAMAGE IN A LASER SCRIBING PROCESS

摘要

PURPOSE: A laser patterning system and a method for manufacturing a semiconductor device using the same are provided to remove residues in a pattern process by interlocking a laser scribing device with a residue removing device.;CONSTITUTION: A process chamber(10) forms a sealed space for the pattern process of a semiconductor device. A laser scribing device(20) patterns a thin film(200) formed on one side of a substrate(100). The laser scribing device includes a first moving unit(21), a laser generating unit(22), and a laser radiating unit(23). A residue removing device(30) removes the residues generated in a thin film patterning process and includes a second moving unit(31) and a residue removing unit(32).;COPYRIGHT KIPO 2012