METHOD FOR CORRECTING AN IMAGE PLACEMENT ERROR OF A PHOTO MASK INCLUDING A MASK PATTERN

摘要

PURPOSE: A method for correcting an image placement error on a photo mask is provided to correct a registration error generated on a photo mask by locally controlling pressure when a light absorption layer is etched and pellicle is attached.;CONSTITUTION: A photo mask(200) including a mask pattern and a light absorption layer are formed. The light absorbing layer is formed on the frame region of the substrate. The photo mask is formed in a field region of the frame region. A first registration error(241) of the photo mask is measured. A second registration error(245) is induced by etching a part of the light absorption layer in the frame region.;COPYRIGHT KIPO 2012