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European Mask and Lithography Conference

召开年：2008
召开地：Dresden(DE)
出版时间：-

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1.Looking for Simple Engineering Solutions in DFM Patents

机译：寻找DFM专利中简单的工程解决方案
- 作者：Artur Balasinski
- 会议名称：《European Mask and Lithography Conference》 | 2013年
- Engineering;
- Solutions;
- Patents;
2.Model-based SRAF Solutions for Advanced Technology Nodes

机译：基于模型的高级技术节点SRAF解决方案
- 作者：Srividya Jayaram;Pat LaCour;James Word;Alexander Tritchkov
- 会议名称：《European Mask and Lithography Conference》 | 2013年
- SRAF;
- rule based;
- model-based;
- process window;
- ILT;
- Local Printability Enhancement;
- weak spot correction;
3.Actinic characterization and modeling of the EUV mask stack

机译：EUV掩模堆栈的光化特征和建模
- 作者：Vicky Philipsen;Eric Hendrickx;Rik Jonckheere;Natalia Davydova;Timon Fliervoet;Jens Timo Neumann
- 会议名称：《European Mask and Lithography Conference》 | 2013年
- EUV;
- mask stack model;
- reflectometry;
- diffractometry;
- actinic characterization;
- rigorous mask 3D lithography simulation;
4.Thermal Probe Nanolithography: in-situ inspection, high-speed, high-resolution, 3D

机译：热探针纳米光刻：原位检测、高速、高分辨率、3D
- 作者：Felix Holzner;Philip Paul;Michel Despont;Lin Lee Cheong;James Hedrick;Urs Dürig;Armin Knoll
- 会议名称：《European Mask and Lithography Conference》 | 2013年
5.Status of the AIMS~(TM) EUV Development Project

机译：AIMS~（TM）EUV开发项目现状
- 作者：Anthony Garetto;Jan Hendrik Peters;Dirk Hellweg;Markus Weiss
- 会议名称：《European Mask and Lithography Conference》 | 2013年
- AIMS~(TM);
- EUV;
- defect review;
- EUV defectivity;
- aerial imaging;
- AIMS~(TM) EUV project;
6.NXE:3300B platform - Imaging applications for Logic and DRAM

机译：NXE:3300B平台-逻辑和DRAM的成像应用
- 作者：Eelco van Setten;Guido Schiffelers;Cristina Toma;Jo Finders;Dorothe Oorschot;Joep van Dijk;Sjoerd Lok;Rudy Peeters
- 会议名称：《European Mask and Lithography Conference》 | 2013年
- EUV lithography;
- imaging;
- masks;
- resist;
- Logic;
- DRAM;