Method for removing solar cell surface damage due to plasma dry etching and manufacturing method of solar cell using same

摘要

PURPOSE: A solar cell surface damage removing method and a solar cell manufacturing method using the same are provided to improve the process efficiency remarkably by preventing the surface damage of the solar cell with simple method of dipping a solar cell substrate in the nitride solution. CONSTITUTION: An emitter layer(110) is formed by injecting the impurity material of second conductive type into a substrate(100). A front side reflection barrier layer(120) is formed on the emitter layer in order to lower the reflectivity of sunlight. A front electrode is formed to pass through the front side reflection barrier layer and contact the emitter layer.