A method for suitable for the operation of a projection exposure apparatus, as well as corresponding projection exposure system

摘要

The present invention relates to a projection exposure apparatus as well as a method for operating a projection exposure apparatus for microlithography with an illuminating system, which is at least a variably adjustable pupils shaping element (4), wherein the illumination load of at least one optical element of the projection exposure system in the case of a a - or adjustment of the at least a variably adjustable pupils shaping element is determined automatically and on the basis of the automatically determined illumination load on the maximum radiation power of the light source is adjusted or is determined, and / or in which an illumination system is provided, with the different illumination settings can be carried out, wherein the use of the projection exposure apparatus and logged from the history of the use of at least a state parameters of at least one optical element is determined of the projection exposure system.