首页>
外国专利>
POSITIVE ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN FILM AND PATTERN FORMATION METHOD USING THE COMPOSITION
POSITIVE ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN FILM AND PATTERN FORMATION METHOD USING THE COMPOSITION
展开▼
机译:正极性射线敏感或辐射敏感的树脂组合物,以及负极性射线敏感或辐射敏感的树脂膜和图案的形成方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
PROBLEM TO BE SOLVED: To provide a positive actinic ray-sensitive or radiation-sensitive resin composition which achieves high sensitivity, high resolution, a good pattern shape, good line edge roughness and suppression of outgassing, and an actinic ray-sensitive or radiation-sensitive resin film and a pattern formation method using the same.;SOLUTION: A positive actinic ray-sensitive or radiation-sensitive resin composition contains a resin (P) including a repeating unit (A) having, in a side chain, nitrogen-containing heterocyclic cationic structure that is decomposed by irradiation of actinic ray or radiation for generating free acid.;COPYRIGHT: (C)2012,JPO&INPIT
展开▼