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Actinic ray-sensitive or radiation-sensitive resin composition, method for producing resin for actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern formation method, and method for manufacturing electronic device
Actinic ray-sensitive or radiation-sensitive resin composition, method for producing resin for actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern formation method, and method for manufacturing electronic device
The actinic ray-sensitive or radiation-sensitive resin composition having excellent resolution and roughness properties, suppressing occurrence of scum, excellent CDU, and excellent aging stability, resin of an actinic ray-sensitive or radiation-sensitive resin composition Providing a manufacturing method and an actinic ray-sensitive or radiation-sensitive film using the composition, a pattern forming method, and a manufacturing method of an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition contains the following (A) to (C), and the content of the compound having a pKa of 4.0 or more in the conjugated acid is 1 ppm or less based on mass based on the total solid content. (A) a resin having a repeating unit represented by the general formula (1), decomposed by the action of an acid, solubility in an alkali developer increases; (B) a compound that generates an acid by irradiation with actinic rays or radiation; (C) A fluorine-containing compound having a group that is decomposed by the action of an alkali developer and increases solubility in the alkali developer In General Formula (1), R
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