首页> 外国专利> Actinic ray-sensitive or radiation-sensitive resin composition, method for producing resin for actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern formation method, and method for manufacturing electronic device

Actinic ray-sensitive or radiation-sensitive resin composition, method for producing resin for actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern formation method, and method for manufacturing electronic device

机译:光化射线敏感或辐射敏感的树脂组合物,用于光化射线敏感或辐射敏感的树脂组合物的树脂的制造方法,光化射线敏感或辐射敏感的膜,图案形成方法和电子设备的制造方法

摘要

The actinic ray-sensitive or radiation-sensitive resin composition having excellent resolution and roughness properties, suppressing occurrence of scum, excellent CDU, and excellent aging stability, resin of an actinic ray-sensitive or radiation-sensitive resin composition Providing a manufacturing method and an actinic ray-sensitive or radiation-sensitive film using the composition, a pattern forming method, and a manufacturing method of an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition contains the following (A) to (C), and the content of the compound having a pKa of 4.0 or more in the conjugated acid is 1 ppm or less based on mass based on the total solid content. (A) a resin having a repeating unit represented by the general formula (1), decomposed by the action of an acid, solubility in an alkali developer increases; (B) a compound that generates an acid by irradiation with actinic rays or radiation; (C) A fluorine-containing compound having a group that is decomposed by the action of an alkali developer and increases solubility in the alkali developer In General Formula (1), R
机译:本发明的光化射线或放射线敏感性树脂组合物的制造方法和特征在于,其具有优异的分辨率和粗糙度特性,抑制浮渣的产生,优异的CDU和优异的老化稳定性。使用该组合物的光化射线敏感或辐射敏感膜,图案形成方法和电子设备的制造方法。光化射线敏感性或放射敏感性树脂组合物包含以下(A)至(C),且基于共轭酸的质量,pKa在pKa中为4.0以上的化合物的含量为1ppm以下。总固含量。 (A)具有由通式(1)表示的重复单元的树脂,该树脂通过酸的作用而分解,在碱性显影液中的溶解度增加。 (B)通过光化射线或放射线照射而产生酸的化合物; (C)具有在碱显影剂的作用下分解并增加在碱显影剂中的溶解度的基团的含氟化合物。通式(1)中,R

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