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TITANIUM BLACK DISPERSION COMPOSITION FOR FORMING LIGHT-BLOCKING FILM AND METHOD OF PRODUCING THE SAME, BLACK RADIATION-SENSITIVE COMPOSITION, BLACK CURED FILM, SOLID-STATE IMAGING ELEMENT, AND METHOD OF PRODUCING BLACK CURED FILM
TITANIUM BLACK DISPERSION COMPOSITION FOR FORMING LIGHT-BLOCKING FILM AND METHOD OF PRODUCING THE SAME, BLACK RADIATION-SENSITIVE COMPOSITION, BLACK CURED FILM, SOLID-STATE IMAGING ELEMENT, AND METHOD OF PRODUCING BLACK CURED FILM
PROBLEM TO BE SOLVED: To provide a titanium black dispersion composition for a solid-state imaging element that exhibits excellent stability over time, and a method of producing the same; and to provide a black radiation-sensitive composition for a solid-state imaging element, the composition exhibiting excellent stability over time, wherein residues originating from a radiation-sensitive composition are prevented from being generated at an area outside a region at which a cured film is to be formed, when the composition is used for forming a black cured film, such as a light-blocking film.SOLUTION: The titanium black dispersion composition comprises: (A) a material to be dispersed, comprising titanium black and Si atoms; (B) a dispersant; and (C) an organic solvent, wherein 90% or more of the material has a particle diameter in a range of from 16 nm to 30 nm, and a content ratio of Si atoms to Ti atoms in the material, represented by Si/Ti, is from 0.20 to 0.50. The method of producing the titanium black dispersion composition, and the radiation-sensitive composition containing the dispersion composition are also provided.
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