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WAFER HOLDING BODY FOR WAFER PROBER AND THE WAFER PROBER EQUIPPED WITH THE SAME

机译:晶圆保持器的晶圆保持机构,以及配备有晶圆保持器的晶圆保持器

摘要

PROBLEM TO BE SOLVED: To provide a wafer holding body which realizes temperature distribution with high accuracy, maintains the flatness of a chuck top while preventing deformation and damage of the chuck top during rapid heating up and cooling down or pressing in probing, and enables highly accurate measurements even after being used repeatedly, and to provide a wafer prober apparatus equipped with the wafer holding body.;SOLUTION: A wafer holding body for a wafer prober 1 includes a chuck top 2 having a chuck top conductor layer 3 on its surface and including a heating body 4; multiple supporting bars 5 supporting the chuck top 2; and a bottom part substrate 6 on which the supporting bars 5 are installed. The supporting bars 5 partially support a rear surface of the chuck top 2. Further, it is preferable that a total chuck top supporting area of the supporting bars 5 is less than 15 percent of the entire area of the rear surface of the chuck top 2. The chuck top 2 can include a cooling module.;COPYRIGHT: (C)2013,JPO&INPIT
机译:解决的问题:提供一种晶片保持体,该晶片保持体能够实现高精度的温度分布,在快速加热,冷却或压入过程中防止卡盘顶部变形和损坏的同时,保持卡盘顶部的平坦度,并实现高度即使在重复使用之后,也能进行精确的测量,并提供一种配备有晶片保持器的晶片探测器设备。解决方案:用于晶片探测器的晶片保持器1包括一个吸盘顶部2,在其表面上具有一个吸盘顶部导体层3,并且包括加热体4;多个支撑杆5支撑卡盘顶部2;底部基板6上安装有支撑杆5。支撑杆5部分地支撑卡盘顶部2的后表面。此外,优选地,支撑杆5的卡盘顶部总支撑面积小于卡盘顶部2的后表面的整个面积的15%。卡盘顶部2可以包括一个冷却模块。版权所有:(C)2013,JPO&INPIT

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