Formation manner of the fluorine-containing high-molecular film which uses the constituent for fluorine-containing high-molecular coat and the constituent for said coat, and formation manner of photoresist or lithography pattern.

摘要

PROBLEM TO BE SOLVED: To provide a means for forming a protective film of a fluorine-containing polymer compound excellent in smoothness and close adhesion on a photoresist, and also a means for removing the protective film without damaging the photoresist of a lower layer.;SOLUTION: This coating polymer composition obtained by dissolving the fluorine-containing polymer compound with a solvent consisting of a fluorinated acetal expressed by general formula (1) is applied on the photoresist, and dried to form the protective film. The fluorinated acetal having the specific structure is also suitable as the solvent for making a contact with the fluorine-containing polymer film, peeling off for removing the film and forming a photoresist or lithographic pattern.;COPYRIGHT: (C)2007,JPO&INPIT