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Abnormal cause specific methods and abnormalities cause specific system

机译:异常导致特定方法而异常导致特定系统

摘要

A feature amount is generated by standardizing inspection data related to a fabrication unit for each type, a similar set including fabrication units corresponding to similar feature amounts is formed by comparing the feature amounts, and apparatus difference analysis is performed between a plurality of fabrication units forming the similar set. A two-level orthogonal table is used to determine whether to adopt a feature amount of each type, and some feature amounts are not used in the apparatus difference analysis and the like by optimizing the smaller-the-better characteristic or the larger-the-better characteristic of a test value of the apparatus difference analysis, thereby reducing the calculation amount and accurately and efficiently specifying an abnormality cause.
机译:通过标准化与每种类型的与制造单元有关的检查数据来生成特征量,通过比较特征量来形成包括与相似特征量相对应的制造单元的相似集合,并且在形成多个制造单元之间进行设备差异分析。类似的集合。两级正交表用于确定是否采用每种类型的特征量,并且通过优化较小特征或较大特征来在设备差异分析等中不使用某些特征量。装置差异分析的测试值具有更好的特性,从而减少了计算量并准确有效地确定了异常原因。

著录项

  • 公开/公告号JP4874580B2

    专利类型

  • 公开/公告日2012-02-15

    原文格式PDF

  • 申请/专利权人 株式会社東芝;

    申请/专利号JP20050174137

  • 发明设计人 松下 宏;

    申请日2005-06-14

  • 分类号H01L21/02;H01L21/66;

  • 国家 JP

  • 入库时间 2022-08-21 17:38:16

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