Vis-a-vis the plasma central processing unit and the plasma

摘要

PROBLEM TO BE SOLVED: To provide plasma treatment equipment that can highly maintain both face-to-face uniformity and in-plane uniformity of plasma processing on a processed object.;SOLUTION: The plasma treatment equipment performs predetermined plasma treatment on an object to be processed. The equipment has a cylinder-shaped treatment vessel 14 that can be made vacuum, a holding means 22 that holds processed objects in plural numbers and contains them in the treatment vessel, a plasma chamber 58 prepared on the treatment vessel's side wall to generate plasma, gas supply means 40 and 42 for plasma that have a gas dispersion nozzle for plasma prepared in a detachable way for supplying the plasma chamber with a gas for plasma without running through in the treatment vessel to the plasma chamber, a plasma formation means 60 for generating plasma in the plasma chamber, and a diaphragm 78 dividing and preparing the treatment vessel and the plasma chamber on which gas holes are formed for active species to feed a gas including active species into the treatment vessel.;COPYRIGHT: (C)2008,JPO&INPIT