首页> 外国专利> ATTACHMENT FOR SUBSTRATES HAVING DIFFERENT DIAMETERS, SUBSTRATE PROCESSING APPARATUS, AND METHOD OF MANUFACTURING SUBSTRATE OR SEMICONDUCTOR DEVICE

ATTACHMENT FOR SUBSTRATES HAVING DIFFERENT DIAMETERS, SUBSTRATE PROCESSING APPARATUS, AND METHOD OF MANUFACTURING SUBSTRATE OR SEMICONDUCTOR DEVICE

机译:具有不同直径的基板的附件,基板处理设备以及基板或半导体设备的制造方法

摘要

A downsized substrate may be housed in a substrate accommodation vessel (FOUP) constituting a transfer system corresponding to a large diameter substrate. An attachment includes an upper plate and a lower plate supported by a first support groove that can support an 8-inch wafer, and holding columns installed at the upper plate and the lower plate and including a second support groove that can support a 2-inch wafer (if necessary, via a wafer holder and a holder member). Accordingly, the 2-inch wafer can be housed in a pod corresponding to the 8-inch wafer, and the pod, which is a transfer system, can be standardized to reduce cost of a semiconductor manufacturing apparatus. In addition, a distance from each gas supply nozzle to the wafer can be increased to sufficiently mix reactive gases before arrival at the wafer and improve film-forming precision to the wafer.
机译:可以将尺寸减小的基板容纳在构成与大直径基板相对应的传送系统的基板容纳容器(FOUP)中。附件包括由可支撑8英寸晶片的第一支撑槽支撑的上板和下板,以及安装在上板和下板并包括可支撑2英寸的第二支撑槽的保持柱。晶圆(如有必要,通过晶圆支架和支架部件)。因此,可以将2英寸晶片容纳在与8英寸晶片相对应的容器中,并且可以标准化作为转移系统的容器以降低半导体制造设备的成本。另外,可以增加从每个气体供应喷嘴到晶片的距离,以在到达晶片之前充分混合反应性气体,并提高对晶片的成膜精度。

著录项

  • 公开/公告号US2012216743A1

    专利类型

  • 公开/公告日2012-08-30

    原文格式PDF

  • 申请/专利权人 TAKESHI ITOH;AKINORI TANAKA;

    申请/专利号US201213407225

  • 发明设计人 AKINORI TANAKA;TAKESHI ITOH;

    申请日2012-02-28

  • 分类号H01L21/205;F16M13/00;C30B25/02;

  • 国家 US

  • 入库时间 2022-08-21 17:33:22

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