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Method for recovering damaged components in lower region of low dielectric insulating film
Method for recovering damaged components in lower region of low dielectric insulating film
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机译:低介电绝缘膜下部区域中受损成分的回收方法
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摘要
There is provided a damage recovery method capable of recovering electrical characteristics of a low dielectric insulating film sufficiently while suppressing oxidation of buried metal and generation of pattern defaults.;A damaged functional group generated in a surface of the low dielectric insulating film by a processing is substituted with a hydrophobic functional group (ST. 2). A damaged component present under a dense layer generated in the surface of the low dielectric insulating film by the substitution process is recovered by using an ultraviolet heating process (ST. 3).
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