首页> 外国专利> PROCESS FOR MANUFACTURING POWER INTEGRATED DEVICES HAVING SURFACE CORRUGATIONS, AND POWER INTEGRATED DEVICE HAVING SURFACE CORRUGATIONS

PROCESS FOR MANUFACTURING POWER INTEGRATED DEVICES HAVING SURFACE CORRUGATIONS, AND POWER INTEGRATED DEVICE HAVING SURFACE CORRUGATIONS

机译:具有表面波纹的功率集成设备的制造过程以及具有表面波纹的功率集成设备的制造过程

摘要

According to a process for manufacturing an integrated power device, projections and depressions are formed in a semiconductor body that extend in a first direction and are arranged alternated in succession in a second direction, transversely to the first direction. Further provided are a first conduction region and a second conduction region. The first conduction region and the second conduction region define a current flow direction parallel to the first direction, along the projections and the depressions. To form the projections and the depressions, portions of the semiconductor body that extend in the first direction and correspond to the depressions, are selectively oxidized.
机译:根据用于制造集成功率器件的方法,在半导体主体中形成在第一方向上延伸的凸起和凹陷,该凸起和凹陷在横向于第一方向的第二方向上连续交替地布置。还提供了第一导电区域和第二导电区域。第一导电区域和第二导电区域沿着突起和凹陷限定平行于第一方向的电流流动方向。为了形成突起和凹陷,半导体本体的在第一方向上延伸并与凹陷相对应的部分被选择性地氧化。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号