N-and P-Channel Field-Effect Transistors with Single Quantum Well for Complementary Circuits

摘要

A complementary metal oxide semiconductor (CMOS) device in which a single In_xGa_1-xSb quantum well serves as both an n-channel and a p-channel in the same device and a method for making the same. The In_xGa_1-xSb layer is part of a heterostructure that includes a Te-delta doped Al_yGa_1-ySb layer above the In_xGa_1-xSb layer on a portion of the structure. The portion of the structure without the Te-delta doped Al_yGa_1-ySb barrier layer can be fabricated into a p-FET by the use of appropriate source, gate, and drain terminals, and the portion of the structure retaining the Te-delta doped Al_yGa_1-ySb layer can be fabricated into an n-FET so that the structure forms a CMOS device, wherein the single In_xGa_1-xSb quantum well serves as the transport channel for both the n-FET portion and the p-FET portion of the heterostructure.