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METHOD FOR OPERATING A PULSED ARC EVAPORATION SOURCE AND VACUUM PROCESS SYSTEM COMPRISING SAID PULSED ARC EVAPORATION SOURCE

机译:包括所述脉冲弧蒸发源的脉冲弧蒸发源和真空过程系统的操作方法

摘要

A novel functional layer (A) of hard material, applied to a workpiece by arc-physical vapor deposition (PVD) and formed from electrically insulating oxide(s) of one or more of Group IV, V or VI transition metals, aluminum, silicon, iron, cobalt, nickel and yttrium, has a noble gas and/or halogen content of less than 2%. Independent claims are included for: (a) a workpiece selected from tools and machine components, provided with a coating (A) as above; and (b) a method for depositing a layer of material (A'), as for (A) but without restrictions on noble gas and/or halogen content, on a workpiece in a vacuum process plant with an arc evaporation source operated by a DC supply, where a pulsed current supply is superimposed, the target of the source contains a metal and the evaporated metal is converted into oxide in an oxygen-containing reactive gas atmosphere.
机译:一种新颖的硬质材料功能层(A),通过电弧物理气相沉积(PVD)施加到工件上,并由第IV,V或VI组过渡金属,铝,硅中的一种或多种的电绝缘氧化物形成,铁,钴,镍和钇的稀有气体和/或卤素含量小于2%。包括以下方面的独立权利要求:(a)选自工具和机械部件的工件,其具有上述涂层(A); (b)在具有电弧蒸发源的真空加工设备中,在工件上沉积如(A)但不限制稀有气体和/或卤素含量的材料(A')的层的方法,在叠加有脉冲电流的直流电源中,源的目标包含金属,并且蒸发的金属在含氧的反应气体气氛中转化为氧化物。

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