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METHOD FOR OPERATING A PULSED ARC EVAPORATION SOURCE AND VACUUM PROCESS SYSTEM COMPRISING SAID PULSED ARC EVAPORATION SOURCE
METHOD FOR OPERATING A PULSED ARC EVAPORATION SOURCE AND VACUUM PROCESS SYSTEM COMPRISING SAID PULSED ARC EVAPORATION SOURCE
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机译:包括所述脉冲弧蒸发源的脉冲弧蒸发源和真空过程系统的操作方法
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摘要
A novel functional layer (A) of hard material, applied to a workpiece by arc-physical vapor deposition (PVD) and formed from electrically insulating oxide(s) of one or more of Group IV, V or VI transition metals, aluminum, silicon, iron, cobalt, nickel and yttrium, has a noble gas and/or halogen content of less than 2%. Independent claims are included for: (a) a workpiece selected from tools and machine components, provided with a coating (A) as above; and (b) a method for depositing a layer of material (A'), as for (A) but without restrictions on noble gas and/or halogen content, on a workpiece in a vacuum process plant with an arc evaporation source operated by a DC supply, where a pulsed current supply is superimposed, the target of the source contains a metal and the evaporated metal is converted into oxide in an oxygen-containing reactive gas atmosphere.
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