首页> 外国专利> METHODS OF FORMING SEMICONDUCTOR FILMS INCLUDING I2-II-IV-VI4 AND I2-(II,IV)-IV-VI4 SEMICONDUCTOR FILMS AND ELECTRONIC DEVICES INCLUDING THE SEMICONDUCTOR FILMS

METHODS OF FORMING SEMICONDUCTOR FILMS INCLUDING I2-II-IV-VI4 AND I2-(II,IV)-IV-VI4 SEMICONDUCTOR FILMS AND ELECTRONIC DEVICES INCLUDING THE SEMICONDUCTOR FILMS

机译:形成包括I 2 -II-IV-VI 4 和I 2 -(II,IV)-IV-VI <的半导体膜的方法Sub> 4 半导体膜和电子设备,包括半导体膜

摘要

Embodiments of the present invention generally include methods for forming semiconductor films having nominal I2-II-IV-VI4 stoichiometry, such as CZTS or CZTSSe, using a solution of including sources of the I, II, IV, and VI elements in a liquid solvent. Precursors may be mixed in the solvent to form the solution. Metal halide salts may be used as precursors in some examples. The solution may be coated onto a substrate and annealed to yield the semiconductor film. In some examples, the source of the 'I' and 'IV' elements may contain the elements in a +2 oxidation state, while the semiconductor film may contain the 'I' element in a +1 oxidation state and the 'IV' element in a +4 oxidation state. Examples may be used to provide I2-(II,IV)-IV-VI4 films.
机译:本发明的实施例通常包括使用以下溶液形成具有标称化学计量的I 2 -II-IV-VI 4 化学计量的半导体膜的方法,例如CZTS或CZTSSe。液态溶剂中I,II,IV和VI元素的来源。可以将前体混合在溶剂中以形成溶液。在一些实例中,金属卤化物盐可用作前体。可以将溶液涂覆到基板上并退火以产生半导体膜。在一些示例中,“ I”和“ IV”元素的来源可以包含处于+2氧化态的元素,而半导体膜可以包含处于+1氧化态的“ I”元素和“ IV”元素处于+4氧化态。示例可以用于提供I 2 -(II,IV)-IV-VI 4 薄膜。

著录项

  • 公开/公告号WO2012112927A3

    专利类型

  • 公开/公告日2012-11-08

    原文格式PDF

  • 申请/专利权人 HILLHOUSE HUGH;KI WOOSEOK;

    申请/专利号WO2012US25706

  • 发明设计人 HILLHOUSE HUGH;KI WOOSEOK;

    申请日2012-02-17

  • 分类号H01L31/06;H01L31/042;H01L31/18;

  • 国家 WO

  • 入库时间 2022-08-21 17:14:08

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