首页> 外国专利> REFLECTION HIGH-ENERGY ELECTRON DIFFRACTION METHOD

REFLECTION HIGH-ENERGY ELECTRON DIFFRACTION METHOD

机译:反射高能电子衍射法

摘要

Provided is a reflection high-energy electron diffraction method that is capable of generating a reflection electron diffraction pattern using an electron beam having an extremely small emission current, in the nanoampere range. In said method, microchannel plates (17a and 17b) that amplify the current of reflected electrons are arranged directly in front of a fluorescent screen (18), an electron beam (28) having an emission current of 1 to 1,000 nA is fired by an electron gun (15) towards the surface of a thin film, reflected electrons current-amplified by the microchannel plates (17a and 17b) are incident upon the fluorescent screen (18), and a reflection electron diffraction pattern produced by the reflected electrons appears on the fluorescent screen (18).
机译:提供了一种反射高能电子衍射方法,其能够使用在纳安范围内具有极小的发射电流的电子束产生反射电子衍射图案。在所述方法中,将放大反射电子的电流的微通道板(17a和17b)直接布置在荧光屏(18)的前面,发射电流为1至1,000nA的电子束(28)被发射。电子枪(15)朝向薄膜表面,由微通道板(17a和17b)放大的反射电子入射到荧光屏(18)上,并且由反射电子产生的反射电子衍射图案出现在荧光屏(18)上。荧光屏(18)。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号