CLUSTER BEAM GENERATING DEVICE, SUBSTRATE PROCESSING DEVICE, CLUSTER BEAM GENERATING METHOD AND SUBSTRATE PROCESSING METHOD

摘要

PURPOSE: A cluster beam generating device, substrate processing device, cluster beam generating method and substrate processing method are provided to rapidly vary a mixing ratio of liquid cluster and cluster gas by changing the temperature of a nozzle using a temperature controlling unit.;CONSTITUTION: A cluster beam generating device comprises a mixer(40), a nozzle(21), a temperature control unit(23) and a controller(24). The mixer mixes a gaseous material and a liquid raw material. The nozzle supplies the gaseous material and liquid raw material as a cluster beam(26). The temperature control unit adjusts the temperature of the nozzle. The temperature of a nozzle is changed by the temperature control unit. The nozzle is selectively converted. The controller controls the temperature of nozzle using the temperature control unit. The controller establishes the nozzle with the temperature control unit as the first temperature and the second temperature. The first temperature is the different temperature of the second temperature.;COPYRIGHT KIPO 2012