首页> 外国专利> METHOD FOR IMPROVING AN ELECTRICAL PROPERTY OF SEMICONDUCTOR DEVICE HAVING HETEROSTRUCTURE

METHOD FOR IMPROVING AN ELECTRICAL PROPERTY OF SEMICONDUCTOR DEVICE HAVING HETEROSTRUCTURE

机译:具有异质结构的半导体装置的电气性能的改善方法

摘要

PURPOSE: a kind of back substrate of the different offer structured illumination protons for the semiconductor device enhancing electrical feature improves the performance of semiconductor devices. ;CONSTITUTION: the different structure of semiconductor devices includes liquid crystal layer growth substrates. Rear side of the proton irradiation to substrate. Liquid crystal layer is GaAs, GaP, GaN being selected from made of group ZnO. It selects made of substrate by group, Si, SiC, GaAs, Sapphire Substrate. ;The 2012 of copyright KIPO submissions
机译:目的:一种为半导体器件提供不同结构的照明质子的背基板,增强电学性能,提高半导体器件的性能。 ;组成:半导体器件的不同结构包括液晶层生长衬底。质子的背面照射到基质上。液晶层是GaAs,GaP,GaN,选自ZnO族。它按组,Si,SiC,GaAs,蓝宝石衬底选择衬底。 ; 2012年版权KIPO提交文件

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号