PITCH DIVISION PATTERNING TECHNIQUES FOR EXPANDING THE FUNCTION OF A LITHOGRAPHY TECHNIQUE EXCEEDING A MINIMUM PITCH

摘要

PURPOSE: Pitch division patterning techniques are provided to increase the physical stability of a pitch divided line by using a process operation of increasing structural rigidity having a high aspect ratio.;CONSTITUTION: A photo resister includes a line having a wide pad. An end part of a spacer is cut through a wet etching process and the line is formed. Landing contact pads(190-197) are arranged in the end part of the spacer. A final hard mask pattern(155) is transferred on a substrate layer(160). The substrate layer includes a single material layer, a plurality of different material layers, and a layer having a domain with different materials or structures.;COPYRIGHT KIPO 2012