SUBSTRATE LAMINATED WITH A RESIST FILM FOR ELECTRON BEAM AND AN ORGANIC CONDUCTIVE FILM, A METHOD FOR MANUFACTURING THE SAME, AND A METHOD FOR FORMING RESIST PATTERNS CAPABLE OF EFFICIENTLY IMPLEMENTING ANTISTATIC OPERATIONS

摘要

PURPOSE: A substrate laminated with a resist film for electron beam and an organic conductive film, a method for manufacturing the same, and a method for forming resist patterns are provided to improve the precision of resist patterns by removing static electricity from the substrate side and the surface side of resist.;CONSTITUTION: A substrate to be processed(2) includes a conductive inorganic thin film(1) as a surface layer. At least resist film(3) for electron beam and an organic conductive film(4) are successively stacked on the substrate. An area(2a), with which the organic conductive film and the conductive inorganic thin film contacts, is arranged on a side to be processed(2') of the substrate to be processed. An area exposing the conductive inorganic thin film is arranged on the side to be process of the substrate to be processed. The area exposing the conductive inorganic thin film is installed at inner part of the side to be processed compared to the virtual crossing line of the side to be processed and the lateral side of the substrate to be processed.;COPYRIGHT KIPO 2012