PHOTO-MASK AND A METHOD FOR MANUFACTURING THE SAME CAPABLE OF IMPROVING THE RESOLUTION OF PATTERNS BY INCLUDING A FIRST LIGHT SHIELDING PATTERN AND A SECOND LIGHT SHIELDING PATTERN RESPECTIVELY FORMED IN THE BLIND REGION AND THE PATTERN REGION OF A TRANSPARENT SUBSTRATE

摘要

PURPOSE: A photo-mask and a method for manufacturing the same are provided to reduce the thickness of a light shielding pattern in a pattern region and to secure optical density by constantly keeping the thickness of a light shielding pattern in a blind region.;CONSTITUTION: A photo-mask(100) includes a photo-mask substrate, a first light shielding pattern(124) of a first thickness and a second light shielding pattern(126). The photo-mask substrate includes a pattern region(P) and a blind region(B). The fist light shielding pattern is formed in the blind region. The second light shielding pattern is formed in the pattern region. The second thickness of the second light shielding pattern is thinner than the first thickness of the first light shielding pattern. The patterns are based on the same material.;COPYRIGHT KIPO 2012