THIN FILM DEPOSITION METHOD AND THIN FILM DEPOSITION DEVICE MODULE USING THE SAME CAPABLE IMPROVING DEPOSITION UNIFORMITY

摘要

PURPOSE: A thin film deposition method and a thin film deposition device module using the same are provided to improve process efficiency by preventing non-uniform thickness of a thin film due to surface difference.;CONSTITUTION: A chamber(112) includes a reaction space. A substrate pallet(120) is formed in the reaction space. A gas distribution plate(116) provides process gas to the substrate. A shaft(122) moves the substrate up and down and rotates the substrate. An exhaust unit(150) discharges reaction gas and a by-product of the reaction space.;COPYRIGHT KIPO 2012