SUSCEPTOR AND A CHEMICAL VAPOR DEPOSITION APPARATUS INCLUDING THE SAME CAPABLE OF IMPROVING THE DEPOSITION UNIFORMITY OF A THIN FILM

摘要

PURPOSE: A susceptor and a chemical vapor deposition apparatus including the same are provided to reduce the heating temperature deviation of a substrate by thickening the center of a unit region than the edge of the unit region.;CONSTITUTION: A planar member(10) includes at least one mounting unit(P1). A bottom side(S1) of a unit region corresponding to the mounting unit are protrusive from the edge to the center of the unit region. A thickness of the unit region becomes thinner from the center to the edge of the unit region. The bottom side of the unit region is protruded with a step shape or a round shape.;COPYRIGHT KIPO 2013;[Reference numerals] (AA) Temperature; (BB) Position;