SUSCEPTOR AND A CHEMICAL VAPOR DEPOSITION APPARATUS, CAPABLE OF IMPROVING TEMPERATURE UNIFORMITY OF AN OBJECT IN A THIN FILM FORMING PROCESS

摘要

PURPOSE: A susceptor and a chemical vapor deposition apparatus are provided to grow a thin film uniformly by changing a structure of a pocket unit receiving an object according to a preset condition.;CONSTITUTION: At least one pocket unit(20) receives an object. A settling unit(21) makes a step from an upper side of the pocket unit and is prepared to set the object. A curvature unit(22) is curved from the settling unit with a preset depth. A radius of curvature of the curvature unit is between 8000 mm and 25000 mm. The curvature unit is formed within the curvature radius. The pocket unit includes a susceptor.;COPYRIGHT KIPO 2010