首页> 外国专利> COMPOSITION FOR OXIDE FILM, A MANUFACTURING METHOD THEREOF, OXIDE THIN FILM AND ELECTRIC COMPONENT USING THE COMPOSITION FOR OXIDE THIN FILMS CAPABLE OF CONTROLLING ELECTRON CONCENTRATION OF OXIDE SEMICONDUCTOR THIN FILMS

COMPOSITION FOR OXIDE FILM, A MANUFACTURING METHOD THEREOF, OXIDE THIN FILM AND ELECTRIC COMPONENT USING THE COMPOSITION FOR OXIDE THIN FILMS CAPABLE OF CONTROLLING ELECTRON CONCENTRATION OF OXIDE SEMICONDUCTOR THIN FILMS

机译:氧化膜的组成,其制造方法,氧化膜和使用能够控制氧化半导体薄膜的电子浓度的氧化膜的组成的电子部件

摘要

PURPOSE: A composition for oxide film, a manufacturing method thereof, oxide thin film and electric component using the composition for oxide thin films are provided to improve electrical properties of the electric components by including indium, zinc and scandium which has low electronegativity.;CONSTITUTION: A composition for oxide film comprises a first compound, a second compound and a third compound. The first compound comprises tin or indium. The second compound comprises zinc. The third compound includes scandium. 1-99 atomic% of scandium is included based on total atom number of zinc and indium or zinc and tin. The atomic ratio of zinc to indium or zinc to tin is 1:5-5:1. The third compound comprises scandium acetate hydrate, scandium acetylacetonate hydrate, scandium chloride, scandium chloride hexahydrate, scandium chloride hydrate, scandium fluoride, scandium nitrate hydrate or a combination thereof. The electric component comprises the oxide semiconductor thin film. The oxide semiconductor thin film comprises indium or tin, zinc, and scandium.;COPYRIGHT KIPO 2012
机译:用途:提供用于氧化膜的组合物,其制造方法,氧化物薄膜和使用该氧化物薄膜的组合物的电子部件,以通过包含具有低电负性的铟,锌和scan来改善电子部件的电性能。 :氧化膜组合物包含第一化合物,第二化合物和第三化合物。第一化合物包括锡或铟。第二化合物包含锌。第三化合物包括scan。基于锌和铟或锌和锡的总原子数,包括1-99原子%的dium。锌与铟或锌与锡的原子比为1:5-5:1。第三化合物包括乙酸scan水合物,乙酰丙酮scan水合物,氯化scan,六水合氯化scan,氯化scan水合物,氟化scan,硝酸scan水合物或其组合。电气部件包括氧化物半导体薄膜。氧化物半导体薄膜包括铟或锡,锌和scan。; COPYRIGHT KIPO 2012

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